Data Science and Intelligent Computing Techniques
Employee Attitude Towards Stress and Absenteeism
Authors: Jyoti S. Yadav, Swati V. Desai and Swati M. Patil
Publishing Date: 09-02-2024
ISBN: 978-81-955020-2-8
Abstract
The primary aim of this research is to identify the key factors contributing to stress and absenteeism among employees in IT companies located in Pune and to examine how these factors impact overall employee performance. The prevalence of stress and absenteeism in the workplace is on the rise, and responsible corporate organizations must take action by providing assistance and support. Our team specializes in this specific area, offering practical strategies to address issues like stress, anxiety, depression, changes in work-life circumstances, work-life balance, and the impact of employee relocation within Pune. (NIOSH Work Organization and Stress Related Disorders: In the document: "According to the United States National Institute for Occupational Safety and Health (NIOSH), work organization and stress-related disorders are of significant concern (NIOSH Work , 2004). Reducing absenteeism can be a significant step in cutting down on business costs. Due to intense competition, companies can no longer afford to tolerate unnecessary absenteeism as they might have in the past. Consequently, many companies are focusing on eliminating or, at the very least, reducing excessive absenteeism. The pressure to meet targets and deadlines not only affects top-level management but also extends to employees across all levels. If stress management concerns are not promptly and adequately addressed, it can lead to decreased productivity among both workers and executives, adding to the burdens management faces.
Keywords
Stress, employee, absenteeism, attitude, IT Companies
Cite as
Jyoti S. Yadav, Swati V. Desai and Swati M. Patil, "Employee Attitude Towards Stress and Absenteeism", In: Satyasai Jagannath Nanda and Rajendra Prasad Yadav (eds), Data Science and Intelligent Computing Techniques, SCRS, India, 2024, pp. 935-943. https://doi.org/10.56155/978-81-955020-2-8-79